Electron microscope & associated equipment maker

1987

APCO Ltd. was established. →

1988

SEM (Scanning Electron Microscope) for EPMA was developed.

1992

Electron beam device for R & D was developed.

Electrostatic high resolution SEM was developed.

EB prototype machine drawing for two dimension was developed.

1993

Precision scriber was developed.

Sputter ion pump backup power was developed.

VME BUS Mini-EOC Driver was developed.

1995

"MINI-EOC" for UHV was commercialized. →

Particle beam column device was developed.

1996

Electron gun was used in sounding rocket. →

Gate valve for variably-formed electron beam lithography system was developed.

1997

Ion sputter system・Plasma coating system was developed.

1998

Tester power supply for electron gun was developed.

1999

General purpose SEM was developed.

80 kV stability power supply for Lab₆ gun was developed.

MINI-EOC element technology development was started.

2000

"MINI-SED" for UHV was commercialized. →

Next generation low acceleration electron beam lithography system was developed.

High emittance FE electron gun for electron-beam lithography was developed.

2001

Precision scriber "AMC series" was commercialized. →

2003

MINI-EOC for surface analysis was developed.

High stability Driver for MINI-EOC was commercialized.

Characteristic X-rays detector was developed.

Aberration correction detector for SEM was developed.

2004

Micro electron beam source "MINI-GUN" was developed. →

ZrO/W brightness analyzing device was developed.

Latent image SEM was developed.

2005

Testing equipment for cold Field Emission (CFE) electron gun was developed.

2007

Project of ultra high resolution SEM development was started to observe CFE electron source. →

2009

Project of nano-imaging system development was started. →

2011

Electron biprism system was commercialized. →

Development of electron beam diffraction device for three dimensional optical response observation was started.